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PSMN2R8-40BS,118N-Channel 40 V 100A (Tc) 211W (Tc) Surface Mount D2PAK
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ABRmicro #.ABR2045-PSMN2R-988894
ManufacturerNexperia USA Inc.
MPN #.PSMN2R8-40BS,118
Estimated Lead Time-
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DatasheetPSMN2R8-40BS(PDF)
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In Stock: 3
Shipped From Shenzhen or Hong Kong Warehouses
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Packaging
Tape & Reel (TR)
Shipping DateNovember 16, 2024
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P-Channel 12 V 10A (Ta) 1.7W (Ta), 13mW (Tc) Surface Mount DFN2020MD-6 Technical Specifications
Series-
Packaging
Tape & Reel (TR)
Lifecycle StatusObsolete
Base Product NumberPSMN2R8
Continuous Drain Current (ID) @ 25°C100A (Tc)
Drain-to-Source Voltage (VDS)40 V
Drain-to-Source On Resistance (Max. Min.Rᴅs(on))10V
FET Feature-
FET TypeN-Channel
Gate Charge Total (Qg)(Max.)71 nC @ 10 V
Common Source Input Capacitance (Cɪss)(Max.)@(Vᴅs)4491 pF @ 20 V
MfrNexperia USA Inc.
Mounting StyleSurface Mount
Operating Temperature-55°C ~ 175°C (TJ)
Maximum Power Dissipation211W (Tc)
RDS(on) Drain-to-Source On Resistance2.9mOhm @ 10A, 10V
Package Type (Mfr.)D2PAK
TechnologyMOSFET (Metal Oxide)
Gate-to-Source Voltage (Vɢs)±20V
VGS(th) Gate-to-Source Threshold Voltage (Max.)4V @ 1mA
Package / CaseTO-263-3, D2PAK (2 Leads + Tab), TO-263AB
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Environmental & Export Classifications
RoHS ComplianceComplies with RoHS 3 Directive (2015/863/EU)
MSL Level1 (Unlimited, ≤ 30°C/85% RH), No special packaging
REACH RegulationNo SVHCs Present
US ECCNEAR99
HTSUS8541.29.0095 (Other; No import duty applies)
Additional Details
The PSMN2R8-40BS,118, manufactured by Nexperia USA Inc., is a high-performance N-Channel MOSFET designed for efficient power management. It boasts a maximum drain-source voltage of 40 V and can handle a continuous current of 100A when mounted on a suitable heat sink. The device comes in a D2PAK surface-mount package, enabling streamlined integration into various circuits. With a low on-state resistance of 2.9 milliohms at 10A and 10V, it ensures lower conduction losses. Additionally, the MOSFET has a power dissipation capacity of 211W at the case temperature, and a gate charge capacitance of 4491 pF at 20 V, contributing to its robust performance in demanding environments.
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